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1

Learning From the Past, Altering the Future: A Tentative Theory of the Effect of Past Relationships on Couples Who Remarry

ANDREW BRIMHALL, KAREN WAMPLER, THOMAS KIMBALL

Journal:

Year:

2008

Language:

english

File:

PDF, 161 KB

english, 2008

2

Observing Attachment Behavior in Couples: The Adult Attachment Behavior Q-Set (AABQ)

Karen S. Wampler, Bruce Riggs, Thomas G. Kimball

Journal:

Year:

2004

Language:

english

File:

PDF, 170 KB

english, 2004

3

Recent changes in automotive paint formulation using pyrolysis-gas chromatography/mass spectrometry for identification

Thomas P. Wampler, Gregory A. Bishea, William J. Simonsick

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1997

Language:

english

File:

PDF, 585 KB

english, 1997

4

Young adult offspring and their families of origin: Cohesion, adaptability, and addiction

Richard Wampler, Judith Fischer, Madoc Thomas, Kevin Lyness

Journal:

Journal of Substance Abuse

Year:

1993

Language:

english

File:

PDF, 368 KB

english, 1993

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

Van Den Broeke, Douglas J., Tanabe, Hiroyoshi, Laidig, Thomas L., Chen, J. Fung, Wampler, Kurt E., Hsu, Stephen D., Shi, Xuelong, Socha, Robert J., Dusa, Mircea V., Corcoran, Noel P.

Year:

2004

Language:

english

File:

PDF, 962 KB

english, 2004

6

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

Hsu, Michael, Tanabe, Hiroyoshi, Laidig, Thomas L., Wampler, Kurt E., Hsu, Stephen D., Shi, Xuelong, Chen, J. Fung, Van Den Broeke, Douglas J., Hsieh, Frank

Year:

2004

Language:

english

File:

PDF, 766 KB

english, 2004

7

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J. Fung, Van Den Broeke, Douglas J., Hsu, Michael, Laidig, Thomas L., Wampler, Kurt E., Shi, Xuelong, Hsu, Stephen, Shafer, Ted, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 563 KB

english, 2002

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Contact hole reticle optimization by using interference mapping lithography (IML)

Socha, Robert J., Tanabe, Hiroyoshi, Van Den Broeke, Douglas J., Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel P., Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong, Conley, Willard

Year:

2004

Language:

english

File:

PDF, 1.22 MB

english, 2004

9

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - 65-nm full-chip implementation using double dipole lithography

Hsu, Stephen D., Chen, J. Fung, Cororan, Noel, Knose, William T., Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Shi, Xuelong, Hsu, Michael, Eurlings, Mark, Finders, Jo, Chiou, Tsann

Year:

2003

Language:

english

File:

PDF, 1.41 MB

english, 2003

10

Thermometric behavior of polyolefins

Thomas P. Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1989

Language:

english

File:

PDF, 518 KB

english, 1989

11

The effect of carbon-black filling on the pyrolysis behavior of natural and synthetic rubbers

Margaret J. Matheson, Thomas P. Wampler, William J. Simonsick Jr.

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1994

Language:

english

File:

PDF, 448 KB

english, 1994

12

Determination of polymer additives using analytical pyrolysis

Karen D. Jansson, Charles P. Zawodny, Thomas P. Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

2007

Language:

english

File:

PDF, 495 KB

english, 2007

13

Enhanced performance discharges in the DIII-D tokamak with lithium wall conditioning

G.L. Jackson, E.A. Lazarus, G.A. Navratil, R. Bastasz, N.H. Brooks, D.T. Garnier, K.L. Holtrop, J.C. Phillips, E.S. Marmar, T.S. Taylor, D.M. Thomas, W.R. Wampler, D.G. Whyte, W.P. West

Journal:

Journal of Nuclear Materials

Year:

1997

Language:

english

File:

PDF, 510 KB

english, 1997

14

Practical applications of analytical pyrolysis

Thomas P. Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

2004

Language:

english

File:

PDF, 184 KB

english, 2004

15

Investigation of monomer ratios in random and block copolymers of ethylene and propylene using pyrolysis–gas chromatography/mass spectrometry

Thomas Wampler, Charles Zawodny, Leticia Mancini, Justin Wampler

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

2003

Language:

english

File:

PDF, 294 KB

english, 2003

16

Platinum-carbon black-titanium dioxide nanocomposite electrocatalysts for fuel cell applications

Satheesh Sambandam, Vinodh Valluri, Wilaiwan Chanmanee, Norma R. de Tacconi, Wesley A. Wampler, Wen-Yuan Lin, Thomas F. Carlson, Vijay Ramani, Krishnan Rajeshwar

Journal:

Journal of Chemical Sciences

Year:

2009

Language:

english

File:

PDF, 568 KB

english, 2009

17

Application of analytical pyrolysis to problems in art and archaeology: A review

Alexander M. Shedrinsky, Thomas P. Wampler, Norman Indictor, Norbert S. Baer

Journal:

Journal of Analytical and Applied Pyrolysis

Year:

1989

Language:

english

File:

PDF, 1.30 MB

english, 1989

18

Introduction to pyrolysis–capillary gas chromatography

Thomas P Wampler

Journal:

Journal of Chromatography A

Year:

1999

Language:

english

File:

PDF, 357 KB

english, 1999

19

Formation of Pyrazines by Chitin Pyrolysis

DIETRICH KNORR, THOMAS P. WAMPLER, RITA A. TEUTONICO

Journal:

Journal of Food Science

Year:

1985

Language:

english

File:

PDF, 261 KB

english, 1985

20

The Adult Attachment Interview and Observed Couple Interaction: Implications for an Intergenerational Perspective on Couple Therapy

KAREN S. WAMPLER, LIN SHI, BRIANA S. NELSON, THOMAS G. KIMBALL

Journal:

Year:

2003

Language:

english

File:

PDF, 1.38 MB

english, 2003

21

Investments in securities: Unraveling the complexities of transfers

Thomas J. Phillips Jr., Bruce M. Wampler

Journal:

Journal of Corporate Accounting & Finance

Year:

1994

Language:

english

File:

PDF, 697 KB

english, 1994

22

Absence of cross-resistance to alkylating agents in cyclophosphamide-resistant L1210 leukemia

Galen L. Wampler, William Regelson, Thomas J. Bardos

Journal:

European Journal of Cancer (1965)

Year:

1965

Language:

english

File:

PDF, 450 KB

english, 1965

23

Gas Chromatography || Pyrolysis Gas Chromatography

Wampler, Thomas P.

Year:

2012

Language:

english

File:

PDF, 910 KB

english, 2012

24

Hydrothermal alteration of the Ediacaran Doushantuo Formation in the Yangtze Gorges area (South China)

Derkowski, Arkadiusz, Bristow, Thomas F., Wampler, J.M., Środoń, Jan, Marynowski, Leszek, Elliott, W. Crawford, Chamberlain, C. Page

Journal:

Geochimica et Cosmochimica Acta

Year:

2013

Language:

english

File:

PDF, 1.45 MB

english, 2013

25

Synthesis of potential dual-acting radiation sensitizer antineoplastic agents: 2,2-dimethylphosphoraziridines containing 2-nitroimidazoles or other electron-affinic moieties

Perlman, Michael E., Dunn, Joseph A., Piscitelli, Thomas A., Earle, Julie, Rose, William C., Wampler, Galen L., MacDiarmid, Joan E., Bardos, Thomas J.

Journal:

Journal of Medicinal Chemistry

Year:

1991

Language:

english

File:

PDF, 1.02 MB

english, 1991

26

Photocatalytically Generated Pt∕C–TiO[sub 2] Electrocatalysts with Enhanced Catalyst Dispersion for Improved Membrane Durability in Polymer Electrolyte Fuel Cells

de Tacconi, Norma R., Chenthamarakshan, C. Ramannair, Rajeshwar, Krishnan, Lin, Wen-Yuan, Carlson, Thomas F., Nikiel, Leszek, Wampler, Wesley A., Sambandam, Satheesh, Ramani, Vijay

Journal:

Journal of The Electrochemical Society

Year:

2008

Language:

english

File:

PDF, 659 KB

english, 2008

27

Nonpulsatile circulatory support: Techniques of insertion

Magovern, George J., Wampler, Richard W., Joyce, Lyle D., Wareing, Thomas H.

Journal:

The Annals of Thoracic Surgery

Year:

1993

Language:

english

File:

PDF, 1.18 MB

english, 1993

28

Ferromagnetism in partially oxidized CuCl

Saerbeck, Thomas, Pereiro, Juan, Wampler, James, Stanley, Jacob, Wingert, James, Shpyrko, Oleg G., Schuller, Ivan K.

Journal:

Journal of Magnetism and Magnetic Materials

Year:

2013

Language:

english

File:

PDF, 1.61 MB

english, 2013

29

Effects of slow heating rates on products of polyethylene pyrolysis

Wampler, Thomas P., Levy, Eugene J.

Journal:

The Analyst (Royal Society of Chemistry)

Year:

1986

Language:

english

File:

PDF, 346 KB

english, 1986

30

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Imaging techniques to support low k1 optical lithography

Conley, W., Nelson-Thomas, C., Brankner, K., Wei Wu,, Strozewski, K., Thompson, M., Lucas, K., Garza, C., Chi-Min Yuan,, Carter, R., Montgomery, P., Socha, R., Yu, L., van den Broke, D., Wampler, K.

Year:

2002

Language:

english

File:

PDF, 48 KB

english, 2002

31

Using Work-Centered Specifications to Integrate Cognitive Requirements into Software Development

Wampler, J., Roth, E., Whitaker, R., Conrad, K., Stilson, M., Thomas-Meyers, G., Scott, R.

Journal:

Proceedings of the Human Factors and Ergonomics Society Annual Meeting

Year:

2006

Language:

english

File:

PDF, 388 KB

english, 2006

32

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Contact hole reticle optimization by using interference mapping lithography (IML)

Socha, Robert J., Van Den Broeke, Douglas J., Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong, Conley, Will, Smith, Bruce W.

Year:

2004

Language:

english

File:

PDF, 1018 KB

english, 2004

33

Work-Centered Design and Evaluation of a C2 Visualization Aid

Roth, E., Stilson, M., Scott, R., Whitaker, R., Kazmierczak, T., Thomas-Meyers, G., Wampler, J.

Journal:

Proceedings of the Human Factors and Ergonomics Society Annual Meeting

Year:

2006

Language:

english

File:

PDF, 519 KB

english, 2006

34

Treatment of patients with juvenile idiopathic arthritis (JIA) in a population-based cohort

Zamora-Legoff, Jorge A., Krause, Megan L., Crowson, Cynthia S., Muskardin, Theresa Wampler, Mason, Thomas, Matteson, Eric L.

Journal:

Clinical Rheumatology

Year:

2016

Language:

english

File:

PDF, 279 KB

english, 2016

35

Juvenile Idiopathic Arthritis in Olmsted County, Minnesota, 1960-2013

Krause, Megan L., Crowson, Cynthia S., Michet, C. John, Mason, Thomas, Muskardin, Theresa Wampler, Matteson, Eric L.

Journal:

Arthritis & Rheumatology

Year:

2016

Language:

english

File:

PDF, 258 KB

english, 2016

36

K-Ar Age Constraints on the Origin of Micaceous Minerals in Savannah River Site Soils, South Carolina, USA

Naumann, Thomas E., Elliott, W. Crawford, Wampler, J. M.

Journal:

Clays and Clay Minerals

Year:

2012

Language:

english

File:

PDF, 505 KB

english, 2012

37

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Hsu, Stephen, Corcoran, Noel P., Eurlings, Mark, Knose, William T., Laidig, Thomas L., Wampler, Kurt E., Roy, Sabita, Shi, Xuelong, Hsu, Chungwei Michael, Chen, J. Fung, Finders, Jo, Socha, Robert J.,

Year:

2002

Language:

english

File:

PDF, 479 KB

english, 2002

38

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Resolution enhancement with high-transmission attenuating phase-shift masks

Socha, Robert J., Conley, Will, Shi, Xuelong, Dusa, Mircea V., Petersen, John S., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Caldwell, Roger F., Morimoto, Hiroaki

Year:

1999

Language:

english

File:

PDF, 3.96 MB

english, 1999

39

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Hsu, Stephen, Wampler, Kurt E., Socha, Robert J., Petersen, John S., Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 2.37 MB

english, 2002

40

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Nakagawa, Kent H., Liebchen, Armin, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 2.32 MB

english, 1999

41

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Eigen-decomposition-based models for model OPC

Shi, Xuelong, Tanabe, Hiroyoshi, Laidig, Thomas L., Chen, J. Fung, Van Den Broeke, Douglas J., Hsu, Stephen D., Hsu, Michael, Wampler, Kurt E., Hollerbach, Uwe

Year:

2004

Language:

english

File:

PDF, 187 KB

english, 2004

42

SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Maslow, Mar

Year:

2002

Language:

english

File:

PDF, 517 KB

english, 2002

43

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Practical method for full-chip optical proximity correction

Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 1.76 MB

english, 1997

44

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Hsu, Stephen, Shi, Xuelong, Hsu, Michael, Burchard, Paul, Chen, J. Fung, Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 465 KB

english, 2002

45

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Socha, Robert J., Shi, Xuelong, Holman, Ken C., Dusa, Mircea V., Conley, Will, Petersen, John S., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Chu, M. C., Su, Chung Jen, Hun

Year:

1999

Language:

english

File:

PDF, 4.29 MB

english, 1999

46

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Application of CPL reticle technology for the 65- and 50-nm node

Conley, Will, Van Den Broeke, Douglas J., Socha, Robert J., Wu, Wei, Litt, Lloyd C., Lucas, Kevin, Nelson-Thomas, Carla M., Roman, Bernard J., Chen, J. Fung, Wampler, Kurt E., Laidig, Thomas L., Hsu,

Year:

2003

Language:

english

File:

PDF, 500 KB

english, 2003

47

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Petersen, John S., Conley, Will, Roman, Bernard J., Litt, Lloyd C., Lucas, Kevin, Wu, Wei, Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Gerold, David J., Socha, Robe

Year:

2002

Language:

english

File:

PDF, 554 KB

english, 2002

48

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Investigation of model OPC optimization based on CD uniformity yield

Roy, Sabita, Chen, J. Fung, Liebchen, Armin, Laidig, Thomas L., Wampler, Kurt E., Hollerbach, Uwe, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 839 KB

english, 2003

49

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Binary halftone chromeless PSM technology for λ/4;optical lithography

Chen, J. Fung, Petersen, John S., Socha, Robert J., Laidig, Thomas L., Wampler, Kurt E., Nakagawa, Kent H., Hughes, Greg P., MacDonald, Susan S., Ng, Waiman, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 4.12 MB

english, 2001

50

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Near-0.3 k 1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Van Den Broeke, Douglas J., Kimmel, Kurt R., Staud, Wolfgang, Socha, Robert, Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, Xuelong

Year:

2003

Language:

english

File:

PDF, 1011 KB

english, 2003

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